Single wafer CVD of silicon nitride for CMOS gate applications

Pomarede, C.C.PomaredeWerkhoven, ChrisChrisWerkhovenWeidmann, J.J.WeidmannBergman, T.T.BergmanGschwandtner, A.A.GschwandtnerHoussa, MichelMichelHoussa2021-10-142021-10-141999https://imec-publications.be/handle/20.500.12860/3759Single wafer CVD of silicon nitride for CMOS gate applicationsProceedings paper