Scatterometry metrology validation with respect to process control

Leray, PhilippePhilippeLerayCheng, ShauneeShauneeChengLaidler, DavidDavidLaidlerD'have, KoenKoenD'haveCharley, Anne-LaureAnne-LaureCharley2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/17479Scatterometry metrology validation with respect to process controlProceedings paper