Scaling the Ge gate stack: Towards sub 1nm EOT

Sioncke, SonjaSonjaSionckeLin, DennisDennisLinDelabie, AnneliesAnneliesDelabieConard, ThierryThierryConardStruyf, HerbertHerbertStruyfDe Gendt, StefanStefanDe GendtCaymax, MattyMattyCaymax2021-10-202021-10-2020122162-8769https://imec-publications.be/handle/20.500.12860/21521Scaling the Ge gate stack: Towards sub 1nm EOTJournal article