X-ray and ToF-SIMS comparison of resistive switching NiO films obtained from controlled Ni thermal oxidation, e-beam and ALD

Lamperti, A.A.LampertiCourtade, LoreneLoreneCourtadeLisoni, JuditJuditLisoniGoux, LudovicLudovicGouxTurquat, C.C.TurquatSpiga, SabinaSabinaSpigaMuller, ChristopheChristopheMullerWouters, DirkDirkWoutersFanciulli, M.M.Fanciulli2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13984X-ray and ToF-SIMS comparison of resistive switching NiO films obtained from controlled Ni thermal oxidation, e-beam and ALDOral presentation