MILP-based optimization of 2-D block masks for timing-aware dummy segment removal in self-aligned multiple patterning layouts

Debacker, PeterPeterDebackerHan, KwangsooKwangsooHanKahng, Andrew B.Andrew B.KahngLee, HyeinHyeinLeeRaghavan, PraveenPraveenRaghavanWang, LutongLutongWang2021-10-242021-10-2420170278-0070https://imec-publications.be/handle/20.500.12860/28184MILP-based optimization of 2-D block masks for timing-aware dummy segment removal in self-aligned multiple patterning layoutsJournal articlehttp://ieeexplore.ieee.org/document/7883867/