Vapor-deposited octadecanethiol masking layer on copper to enable area selective Hf3N4 atomic layer deposition on dielectrics studied by in situ spectroscopic ellipsometry

Lecordier, LaurentLaurentLecordierHerregods, SebastiaanSebastiaanHerregodsArmini, SilviaSilviaArmini2021-10-252021-10-2520180734-2101https://imec-publications.be/handle/20.500.12860/31140Vapor-deposited octadecanethiol masking layer on copper to enable area selective Hf3N4 atomic layer deposition on dielectrics studied by in situ spectroscopic ellipsometryJournal articlehttps://avs.scitation.org/doi/full/10.1116/1.5025688