Wen, Liang GongLiang GongWenYamashita, FumikoFumikoYamashitaTang, BaojunBaojunTangCroes, KristofKristofCroesTahara, ShigeruShigeruTaharaShimoda, KeiichiKeiichiShimodaMaeshiro, TakeruTakeruMaeshiroNishimura, EiichiEiichiNishimuraLazzarino, FredericFredericLazzarinoCiofi, IvanIvanCiofiBoemmels, JuergenJuergenBoemmelsTokei, ZsoltZsoltTokei2021-10-232021-10-232015https://imec-publications.be/handle/20.500.12860/26174Direct etched Cu characterization for advanced interconnectsProceedings paperhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=7325613