Kesters, ElsElsKestersClaes, MartineMartineClaesLe, Quoc ToanQuoc ToanLeLux, MarcelMarcelLuxFranquet, AlexisAlexisFranquetVereecke, GuyGuyVereeckeMertens, PaulPaulMertensFrank, Martin M.Martin M.FrankCarleer, RobertRobertCarleerAdriaensens, PeterPeterAdriaensensBiebuyck, J.J.J.J.BiebuyckBebelman, SabineSabineBebelman2021-10-172021-10-1720080040-6090https://imec-publications.be/handle/20.500.12860/13947Chemical and structural modifications in a 193-nm photoresist after low-k dry etchJournal article