The Fermi-level efficiency method and its applications on high interface trap density oxide-semiconductor interfaces

Lin, DennisDennisLinBrammertz, GuyGuyBrammertzMartens, KoenKoenMartensDe Valicourt, GuilhemGuilhemDe ValicourtNegre, LaurentLaurentNegreWang, Wei-EWei-EWangTsai, WilmanWilmanTsaiMeuris, MarcMarcMeurisHeyns, MarcMarcHeyns2021-10-182021-10-1820090003-6951https://imec-publications.be/handle/20.500.12860/15722The Fermi-level efficiency method and its applications on high interface trap density oxide-semiconductor interfacesJournal articlehttp://scitation.aip.org/getpdf/servlet/GetPDFServlet?filetype=pdf&id=APPLAB000094000015153508000001&idtype=cvips&prog=search