Exploration of new resist chemistries and process methods for enabling dual-tone development

Fonseca, CarlosCarlosFonsecaSomervell, M.M.SomervellScheer, S.S.ScheerKuwahara, Y.Y.KuwaharaNafus, KathleenKathleenNafusGronheid, RoelRoelGronheidTarutani, S.S.Tarutani2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15320Exploration of new resist chemistries and process methods for enabling dual-tone developmentProceedings paper