Fetzer, C.C.FetzerDézsi, I.I.DézsiVantomme, AndreAndreVantommeWu, M.F.M.F.WuJin, S.S.JinBender, HugoHugoBender2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6321Ternary CoxFe(1-x)Si2 and NixFe(1-x)Si2 formed by ion implantation in siliconJournal article