HfO2 atomic layer deposition using HfCl4/H2O: the first reaction cycle

Nyns, LauraLauraNynsDelabie, AnneliesAnneliesDelabieCaymax, MattyMattyCaymaxHeyns, MarcMarcHeynsVan Elshocht, SvenSvenVan ElshochtVinckier, ChrisChrisVinckierDe Gendt, StefanStefanDe Gendt2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14230HfO2 atomic layer deposition using HfCl4/H2O: the first reaction cycleProceedings paperhttp://ecsdl.aip.org/ECST