Source mask optimization ( SMO) study for high-NA EUV lithography to achieve single patterning on random logic metal

Hwang, SoobinSoobinHwangGillijns, WernerWernerGillijnsDe Gendt, StefanStefanDe GendtKim, Ryan Ryoung HanRyan Ryoung HanKim2024-08-262024-06-152024-08-262024978-1-5106-7214-70277-786XWOS:001224292100027https://imec-publications.be/handle/20.500.12860/44033Source mask optimization ( SMO) study for high-NA EUV lithography to achieve single patterning on random logic metalProceedings paper10.1117/12.3010869978-1-5106-7215-4WOS:001224292100027