Depth profiling of ZrO2/SiO2/Si stacks-a TOF-SIMS and computer simulation study

Ignatova, V.A.V.A.IgnatovaConard, ThierryThierryConardMöller, W.W.MöllerVandervorst, WilfriedWilfriedVandervorstGijbels, R.R.Gijbels2021-10-152021-10-152004-05https://imec-publications.be/handle/20.500.12860/9087Depth profiling of ZrO2/SiO2/Si stacks-a TOF-SIMS and computer simulation studyProceedings paper