Characterization of post-etched photoresist and residues by various analytical techniques

Franquet, AlexisAlexisFranquetClaes, MartineMartineClaesConard, ThierryThierryConardKesters, ElsElsKestersVereecke, GuyGuyVereeckeVandervorst, WilfriedWilfriedVandervorst2021-10-172021-10-1720080169-4332https://imec-publications.be/handle/20.500.12860/13736Characterization of post-etched photoresist and residues by various analytical techniquesJournal article