Integration of porogen-based low-k films: influence of capping layer thickness and long thermal anneals on low-k damage and reliability

De Roest, DavidDavidDe RoestVereecke, BartBartVereeckeHuffman, CraigCraigHuffmanHeylen, NancyNancyHeylenCroes, KristofKristofCroesArai, HHAraiTakamure, NNTakamureBeynet, JulienJulienBeynetSprey, HesselHesselSpreyMatsushita, KKMatsushitaKobayashi, NNKobayashiVerdonck, PatrickPatrickVerdonckDemuynck, StevenStevenDemuynckBeyer, GeraldGeraldBeyerTokei, ZsoltZsoltTokei2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15181Integration of porogen-based low-k films: influence of capping layer thickness and long thermal anneals on low-k damage and reliabilityMeeting abstract