Diffusion-less junctions and super halo profiles for PMOS transistors formed by SPER and FUSI gate in 45 nm physical gate length devices

Severi, SimoneSimoneSeveriKottantharayil, AnilAnilKottantharayilPawlak, BartekBartekPawlakDuffy, RayRayDuffyHenson, K.K.HensonLindsay, R.R.LindsayLauwers, AnneAnneLauwersVeloso, AnabelaAnabelaVelosode Marneffe, Jean-FrancoisJean-Francoisde MarneffeRamos, JavierJavierRamosSijmus, BramBramSijmusDevriendt, KatiaKatiaDevriendtCamillo-Castillo, A.A.Camillo-CastilloEyben, PierrePierreEybenVandervorst, WilfriedWilfriedVandervorstJurczak, GosiaGosiaJurczakBiesemans, SergeSergeBiesemansDe Meyer, KristinKristinDe Meyer2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9582Diffusion-less junctions and super halo profiles for PMOS transistors formed by SPER and FUSI gate in 45 nm physical gate length devicesProceedings paper