Structural and electrical properties of HfO2/n-InxGa1-xAs structures (x: 0, 0.15, 0.3 and 0.53)

Hurley, P.K.P.K.HurleyO'Connor, E.E.O'ConnorMonaghan, S.S.MonaghanLong, R.D.R.D.LongO'Mahony, A.A.O'MahonyPovey, I.M.I.M.PoveyCherkaoui, K.K.CherkaouiMacHale, J.J.MacHaleQuinn, A.J.A.J.QuinnBrammertz, GuyGuyBrammertzHeyns, MarcMarcHeynsNewcomb, S.B.S.B.NewcombAfanasiev, ValeriValeriAfanasievSonnet, A.M.A.M.SonnetGalatage, R.V.R.V.GalatageJivani, M.N.M.N.JivaniVogel, E.M.E.M.VogelWallace, R.M.R.M.WallacePemble, M.E.M.E.Pemble2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15509Structural and electrical properties of HfO2/n-InxGa1-xAs structures (x: 0, 0.15, 0.3 and 0.53)Proceedings paper