Le, Quoc ToanQuoc ToanLeKesters, ElsElsKestersPrager, LutzLutzPragerLux, MarcelMarcelLuxMarsik, PremyslPremyslMarsikVereecke, GuyGuyVereecke2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15678Application of UV irradiation in removal of post-etch 193 nm photoresistProceedings paper