Brux, O.O.BruxDress, P.P.DressSchmalfuss, H.H.SchmalfussJonckheere, RikRikJonckheereKoolen-Hermkens, W.W.Koolen-Hermkens2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/20401Challenges and solutions ensuring EUVL photomask integrityProceedings paper