Demonstration of an N7 integrated fab process for metal oxide EUV photoresist

De Simone, DaniloDaniloDe SimoneMao, MingMingMaoKocsis, MichaelMichaelKocsisDe Schepper, PeterPeterDe SchepperLazzarino, FredericFredericLazzarinoVandenberghe, GeertGeertVandenbergheYamashita, FumikoFumikoYamashitaStowers, JasonJasonStowersMeyers, StevenStevenMeyersGrenville, AndrewAndrewGrenvilleLuong, VinhVinhLuongParnell, DoniDoniParnellClark, Benjamin L.Benjamin L.Clark2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/26511Demonstration of an N7 integrated fab process for metal oxide EUV photoresistProceedings paperhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2505774