Magchiels, G.G.MagchielsDeduytsche, D.D.DeduytscheKotsedi, L.L.KotsediLoo, RogerRogerLooMtshali, C. B.C. B.MtshaliSegola, I. K.I. K.SegolaSpettel, N.N.Spettelvan Stiphout, K.K.van StiphoutVohra, AnuragAnuragVohraDetavernier, C.C.DetavernierVantomme, A.A.Vantomme2026-02-122026-02-122025-10-011359-6454https://imec-publications.be/handle/20.500.12860/58785In the pursuit of high-quality contact materials for (opto)electronic devices, replacing Ni with Pt is explored to offer a path towards more stable (stano)germanide contacts. In this study, we resolve the complex sequence of Pt (stano)germanide phase formation through real-time probing of the elemental redistribution using Rutherford backscattering spectrometry, complemented with X-ray diffraction, and the use of artificial neural networks. The existence of the Pt(Ge(Sn)) phase is confirmed, forming simultaneously with PtGe(Sn). Both Pt/Ge and Pt/GeSn systems follow the same phase sequence; however, the Pt/Ge system exhibits superior thermal stability of the monogermanide and the Ge-rich phases throughout an extended temperature range, as well as better morphological stability up to 600 °C, attributed to nucleation-controlled growth of the Ge-rich phases. The metastable incorporation of 7.5% Sn in Ge modifies the thermodynamic and kinetic behavior of Pt stanogermanide formation, as observed by the reduced compositional and morphological stability at elevated temperatures.engGrowth and stability of Pt germanides on Ge and GeSn substratesJournal article10.1016/j.actamat.2025.121580WOS:001588380300001PHASE-FORMATIONPLATINUMBEHAVIORNICKELFILMSNISI