Mannaert, GeertGeertMannaertVos, RitaRitaVosTsvetanova, DianaDianaTsvetanovaAltamirano Sanchez, EfrainEfrainAltamirano SanchezWitters, LiesbethLiesbethWittersDemand, MarcMarcDemandSonnemans, R.R.SonnemansBerry, I.I.Berry2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/19377Optimization of resist ash processes on Si045Ge055 substrates for post extension-halo ion implantationProceedings paper