A new method to extract the silicon film thickness of enhancement mode fully depleted SOI nMOSFETs at 300K

Nicolett, A. S.A. S.NicolettMartino, Joao AntonioJoao AntonioMartinoSimoen, EddyEddySimoenClaeys, C.C.Claeys2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4621A new method to extract the silicon film thickness of enhancement mode fully depleted SOI nMOSFETs at 300KOral presentation