Ar-cluster beam profiling of material modifications in ion implanted deep ultraviolet photoresist

Conard, ThierryThierryConardFranquet, AlexisAlexisFranquetTsvetanova, DianaDianaTsvetanovaMouhib, TarikTarikMouhibVandervorst, WilfriedWilfriedVandervorst2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/18722Ar-cluster beam profiling of material modifications in ion implanted deep ultraviolet photoresistMeeting abstract