Modelling the lithography of ion implantation resists on topography

Winroth, GustafGustafWinrothVaglio Pret, AlessandroAlessandroVaglio PretErcken, MoniqueMoniqueErckenRobertson, StewartStewartRobertsonBiafore, John J.John J.Biafore2021-10-222021-10-222014https://imec-publications.be/handle/20.500.12860/24824Modelling the lithography of ion implantation resists on topographyProceedings paperhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1857393