Lucas, KevinKevinLucasSlezak, MarkMarkSlezakErcken, MoniqueMoniqueErckenVan Roey, FriedaFriedaVan Roey2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5457193-nm contact photoresist reflow feasibility studyProceedings paper