Roadblocks and critical aspects for sub 45 nm wafer cleaning and possible solutions

Mertens, PaulPaulMertensVos, RitaRitaVosVereecke, GuyGuyVereeckeJanssens, TomTomJanssensWostyn, KurtKurtWostynClaes, MartineMartineClaesKesters, ElsElsKestersLe, Quoc ToanQuoc ToanLeHalder, SandipSandipHalderHoyer, RonaldRonaldHoyerAndreas, MichaelMichaelAndreasKim, Kyung HyunKyung HyunKimBarbagini, FrancescaFrancescaBarbaginiZijlstra, AaldertAaldertZijlstraHolsteyns, FrankFrankHolsteynsKim, Tae-GonTae-GonKimKenis, KarineKarineKenisArnauts, SophiaSophiaArnautsLux, MarcelMarcelLuxBearda, TwanTwanBeardaHeyns, MarcMarcHeyns2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14159Roadblocks and critical aspects for sub 45 nm wafer cleaning and possible solutionsProceedings paper