Electron beam / DUV intra-level mix-and-match lithography for random logic 0.25 μm CMOS

Jonckheere, RikRikJonckheereTritchkov, AlexanderAlexanderTritchkovVan Driessche, VeerleVeerleVan DriesscheVan den hove, LucLucVan den hove2021-09-292021-09-291995https://imec-publications.be/handle/20.500.12860/696Electron beam / DUV intra-level mix-and-match lithography for random logic 0.25 μm CMOSJournal article