Optimized illumination sources for through-pitch contact hole printing at 1.20 and 1.35NA.

Bekaert, JoostJoostBekaertTruffert, VincentVincentTruffertWillems, PatrickPatrickWillemsVan Look, LieveLieveVan LookOp de Beeck, MaaikeMaaikeOp de BeeckHendrickx, EricEricHendrickxVandenberghe, GeertGeertVandenberghe2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/11710Optimized illumination sources for through-pitch contact hole printing at 1.20 and 1.35NA.Proceedings paper