Preserving printed wafer CD stability in high-frequency EUVL mask cleaning

Wähler, TobiasTobiasWählerSingh, SherjangSherjangSinghDietze, UweUweDietzeJonckheere, RikRikJonckheereRonse, KurtKurtRonseBaudemprez, BartBartBaudemprez2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/20124Preserving printed wafer CD stability in high-frequency EUVL mask cleaningProceedings paper