Xu, XiuMeiXiuMeiXuTao, ZhengZhengTaoSaib, MohamedMohamedSaibSebaai, FaridFaridSebaaiVan de Kerkhove, JeroenJeroenVan de KerkhoveVrancken, NandiNandiVranckenVereecke, GuyGuyVereeckeHolsteyns, FrankFrankHolsteyns2021-10-262021-10-262018https://imec-publications.be/handle/20.500.12860/32314300 mm wafer development for pattern collapse evaluationsProceedings paperhttps://www.scientific.net/SSP.282.207