Metal-barrier induced damage in self-assembly based organosilica low-k dielectrics and its reduction by surfactant residues

Krishtab, MikhailMikhailKrishtabde Marneffe, Jean-FrancoisJean-Francoisde MarneffeArmini, SilviaSilviaArminiWilson, ChrisChrisWilsonDe Gendt, StefanStefanDe Gendt2021-10-252021-10-252018https://imec-publications.be/handle/20.500.12860/31085Metal-barrier induced damage in self-assembly based organosilica low-k dielectrics and its reduction by surfactant residuesMeeting abstracthttp://mam2018.mdm.imm.cnr.it/MAM2018.pdf