Investigation of spatial and energetic trap distributions in 1 nm EOT SiO2/HfO2 by discharging-sweep mode amplitude charge pumping

Chung, Eun-AeEun-AeChungNam, Kab-JinKab-JinNamKim, Young-PilYoung-PilKimMin, Ji-YoungJi-YoungMinCho, Moon JuMoon JuChoHong, HyungseokHyungseokHongHan, JeongJeongHanLee, Jae-DukJae-DukLeeShin, Yu-GyunYu-GyunShinChoi, SiyoungSiyoungChoiKim, SangsigSangsigKim2021-10-192021-10-1920111293-2558https://imec-publications.be/handle/20.500.12860/18697Investigation of spatial and energetic trap distributions in 1 nm EOT SiO2/HfO2 by discharging-sweep mode amplitude charge pumpingJournal article