Verdonck, PatrickPatrickVerdonckMaheshwari, AbhishekAbhishekMaheshwariSwerts, JohanJohanSwertsTielens, HildeHildeTielensFranquet, AlexisAlexisFranquetLoyo Prado, JanaJanaLoyo PradoArmini, SilviaSilviaArminiBaklanov, MikhaïlMikhaïlBaklanovVan Elshocht, SvenSvenVan ElshochtUedono, AkiraAkiraUedonoRoque Huanca, DaniloDaniloRoque HuancaGomes dos Santos Filho, SebastiaoSebastiaoGomes dos Santos FilhoKellerman, GuintherGuintherKellerman2021-10-212021-10-2120132162-8769https://imec-publications.be/handle/20.500.12860/23325Detailed characterization of the effects of plasma treatments on an advanced 2.0 low-k materialJournal articlehttp://jss.ecsdl.org/content/2/5/N103.short