Modification of low-k SiCOH film porosity by a HF solution

Shamiryan, DenisDenisShamiryanBaklanov, MikhaïlMikhaïlBaklanovVereecke, GuyGuyVereeckeVanhaelemeersch, SergeSergeVanhaelemeerschMaex, KarenKarenMaex2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5650Modification of low-k SiCOH film porosity by a HF solutionProceedings paper