Atomic Layer Deposition of Ruthenium Dioxide Based on Redox Reactions between Alcohols and Ruthenium Tetroxide

Poonkottil, NithinNithinPoonkottilMinjauw, Matthias M.Matthias M.MinjauwWerbrouck, AndreasAndreasWerbrouckChecchia, StefanoStefanoChecchiaSolano, EduardoEduardoSolanoNisula, MikkoMikkoNisulaFranquet, AlexisAlexisFranquetDetavernier, ChristopheChristopheDetavernierDendooven, JolienJolienDendooven2023-01-042022-10-122022-10-192023-01-042022-09-210897-4756WOS:000861669700001https://imec-publications.be/handle/20.500.12860/40554Atomic Layer Deposition of Ruthenium Dioxide Based on Redox Reactions between Alcohols and Ruthenium TetroxideJournal article10.1021/acs.chemmater.2c02292WOS:000861669700001OXIDE THIN-FILMSCYCLIC VOLTAMMETRIC DEPOSITIONIN-SITUELECTROCHEMICAL CAPACITORSXPS INVESTIGATIONSREACTION-MECHANISMVAPOR-DEPOSITIONOXIDATION-STATEHYDROUS RUO2OXYGEN