Wada, MMWadaTakahashi, HHTakahashiSnow, JJSnowVos, RitaRitaVosMertens, PWPWMertensShirakawa, HHShirakawa2021-10-192021-10-192010https://imec-publications.be/handle/20.500.12860/18321Applicable solvent photoresist strip process for high-k/metal gateMeeting abstract