Charge trapping in metal-ferroelectric-insulator-semiconductor structure with SrBi2Ta2O9/Al2O3/SiO2 stack

Xu, ZhenZhenXuKaczer, BenBenKaczerJohnson, JoJoJohnsonWouters, DirkDirkWoutersGroeseneken, GuidoGuidoGroeseneken2021-10-152021-10-152004-08https://imec-publications.be/handle/20.500.12860/9947Charge trapping in metal-ferroelectric-insulator-semiconductor structure with SrBi2Ta2O9/Al2O3/SiO2 stackJournal article