Techniques for removal of contamination from EUVL mask without surface damage

Singh, SherjangSherjangSinghChen, SsuweiSsuweiChenWähler, TobiasTobiasWählerJonckheere, RikRikJonckheereLiang, TedTedLiangChen, Robert J.Robert J.ChenDietze, UweUweDietze2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/17994Techniques for removal of contamination from EUVL mask without surface damageProceedings paper