HfO2 high-k gate dielectrics on germanium by molecular beam deposition

Dimoulas, G.G.DimoulasMavrou, G.G.MavrouVellianitis, G.G.VellianitisEvangelou, E.E.EvangelouBoukos, N.N.BoukosTravlos, A.A.TravlosHoussa, MichelMichelHoussaCaymax, MattyMattyCaymax2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/8849HfO2 high-k gate dielectrics on germanium by molecular beam depositionOral presentation