Preparation and residual stress characterisation of polycrystalline silicon germanium films grown by atmospheric pressure chemical vapour deposition

Fiorini, PaoloPaoloFioriniSedky, SherifSherifSedkyCaymax, MattyMattyCaymaxBaert, KrisKrisBaert2021-09-302021-09-301997https://imec-publications.be/handle/20.500.12860/1884Preparation and residual stress characterisation of polycrystalline silicon germanium films grown by atmospheric pressure chemical vapour depositionProceedings paper