Evaluation of advanced I-line resists for practical 0.5*(l/NA) lithography

Tzviatkov, PlamenPlamenTzviatkovPforr, RainerRainerPforrJaenen, PatrickPatrickJaenenVertommen, JohanJohanVertommenVan den hove, LucLucVan den hove2021-09-292021-09-291994https://imec-publications.be/handle/20.500.12860/382Evaluation of advanced I-line resists for practical 0.5*(l/NA) lithographyProceedings paper