Effective electrical passivation of Ge(100) for HfO2 gate dielectric layers using O2 plasma

Xie, QiQiXieDeduytsche, DavyDavyDeduytscheSchaekers, MarcMarcSchaekersCaymax, MattyMattyCaymaxDelabie, AnneliesAnneliesDelabieQu, Xin-PingXin-PingQuDetavernier, ChristopheChristopheDetavernier2021-10-192021-10-1920111099-0062https://imec-publications.be/handle/20.500.12860/20161Effective electrical passivation of Ge(100) for HfO2 gate dielectric layers using O2 plasmaJournal article