Yamamoto, KazuhikoKazuhikoYamamotoKubicek, StefanStefanKubicekRothschild, AudeAudeRothschildMitsuhashi, RiichirouRiichirouMitsuhashiDeweerd, WimWimDeweerdVeloso, AnabelaAnabelaVelosoJurczak, GosiaGosiaJurczakBiesemans, SergeSergeBiesemansDe Gendt, StefanStefanDe GendtWickramanayaka, S.S.WickramanayakaHayashi, S.S.HayashiNiwa, MasaakiMasaakiNiwa2021-10-162021-10-162005-06https://imec-publications.be/handle/20.500.12860/11584PVD-HfSiON gate dielectrics with Ni-FUSI electrode for 65nm LSTP applicationJournal article