Now showing items 1-2 of 2

    • Freeform illumination sources: Source mask optimization for 22 nm node SRAM 

      Bekaert, Joost; Laenens, Bart; Verhaegen, Staf; Van Look, Lieve; Trivkovic, Darko; Lazzarino, Frederic; Vandenberghe, Geert; Van Adrichem, Paul; Socha, Robert; Mulder, M.; Baron, Stanislas; Tsai, Min-Chun; Ning, Kai; Hsu, Stephen; Bouma, A.; van der Heijden, E.; Schreel, Koen; Carpaij, R.; Dusa, Mircea; Zimmerman, Joerg; Graeupner, Paul; Hennerkes, Christoph (2009)
    • Mask Contribution to OPC Model Accuracy 

      Lyons, Adam; Wallow, Tom; Hennerkes, Christoph; Spence, Chris; Delorme, Max; Rio, David; Tsunoda, Dai; Torigoe, Yohei; Hamaji, Masakazu (2020)