Browsing by author "Smith, Mark"
Now showing items 1-4 of 4
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DSA graphoepitaxy calibrations for contact hole multiplication
Graves, Trey; Vaglio Pret, Alessandro; Robertson, Stuart; Smith, Mark; Doise, Jan; Bekaert, Joost; Gronheid, Roel (2015) -
Impact of mask three dimensional effects on resist-model calibration
De Bisschop, Peter; Muelders, Thomas; Klostermann, Ulrich; Schmoeller, Thomas; Biafore, John; Robertson, Stewart A.; Smith, Mark (2009) -
Statistical simulation of resist at EUV and ArF
Biafore, John; Smith, Mark; Mack, Chris A.; Thackeray, James; Gronheid, Roel; Robertson, Stewart; Graves, Trey; Blankenship, David (2009) -
Stochastic and systematic patterning failure mechanisms for contact-holes in EUV lithography: part 2
Vaglio Pret, Alessandro; De Bisschop, Peter; Smith, Mark; Biafore, John (2014)