Browsing by author "Delorme, Max"
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Extend 0.33 NA extreme ultraviolet single patterning to pitch 28-nm metal design by low-n mask
Xu, Dongbo; Gillijns, Werner; Tan, Ling Ee; Rio, David; Delorme, Max; Philipsen, Vicky; Kim, Ryan Ryoung han (2022-11-25)