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Characterization and residue elimination of hot aluminum etching in a transformer coupled plasma etcher

dc.contributor.authorKopalidis, Peter
dc.contributor.authorVertommen, Johan
dc.contributor.authorBadenes, Gonçal
dc.date.accessioned2021-09-29T14:40:30Z
dc.date.available2021-09-29T14:40:30Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1308
dc.sourceIIOimport
dc.titleCharacterization and residue elimination of hot aluminum etching in a transformer coupled plasma etcher
dc.typeJournal article
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1763
dc.source.endpage1768
dc.source.journalJournal of Electrochemical Society
dc.source.issue5
dc.source.volume143
imec.availabilityPublished - open access


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