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Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow

dc.contributor.authorPathangi Sriraman, Hari
dc.contributor.authorChan, BT
dc.contributor.authorBayana, Hareen
dc.contributor.authorVandenbroeck, Nadia
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorVan Look, Lieve
dc.contributor.authorRincon Delgadillo, Paulina
dc.contributor.authorCao, Yi
dc.contributor.authorKim, JiHoon
dc.contributor.authorLin, Guanyang
dc.contributor.authorParnell, Doni
dc.contributor.authorNafus, Kathleen
dc.contributor.authorHarukawa, Ryota
dc.contributor.authorChikashi, Ito
dc.contributor.authorPolli, Marco
dc.contributor.authorD'Urzo, Lucia
dc.contributor.authorGronheid, Roel
dc.contributor.authorNealey, Paul
dc.date.accessioned2021-10-22T21:42:30Z
dc.date.available2021-10-22T21:42:30Z
dc.date.issued2015
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25741
dc.sourceIIOimport
dc.titleDefect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow
dc.typeJournal article
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorBayana, Hareen
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorD'Urzo, Lucia
dc.contributor.imecauthorGronheid, Roel
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage31204
dc.source.journalJournal of Micro/Nanolithography MEMS and MOEMS
dc.source.issue3
dc.source.volume14
dc.identifier.urlhttp://nanolithography.spiedigitallibrary.org/article.aspx?articleid=2389280
imec.availabilityPublished - open access


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